Multicomponent TixNbCrAl nitride films deposited by dc and high-power impulse magnetron sputtering

Multicomponent TixNbCrAl nitride films were deposited on Si(100) substrates by reactive direct current magnetron sputtering (dcMS) and high power impulse (HiPIMS) in the absence of substrate heating bias. Three single Ti, Nb, Cr50Al50 targets either driven three dc or HiPIMS supplies. The Ti content was varied tuning applied to target. composition determined ion beam analysis. nitrogen is nearly stoichiometric (48–50 at.%) series, while dcMS are understoichiometric (39–45 at.%). crystal structure, stress density studied film investigated X-ray techniques microstructure examined scanning electron microscopy. All Ti-containing for both series exhibit an fcc NaCl-type phase structure. In particular, shows a (111) preferred orientation, resulting faceted surface morphology compared dense smooth films. compressive (> 2.0 GPa) significantly larger than values (<0.5 GPa). Nanoindentation measurements show maximum hardness 29.9 GPa Young's modulus 304 obtained series. results may promote synthesis complex multicomponent application aspect protective hard coatings.